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Evidence for a defect level above the conduction band edge of InAs/InAsSb type-II superlattices for applications in efficient infrared photodetectors

机译:在高效红外光电探测器中应用的InAs / InAsSb II型超晶格的导带边缘以上的缺陷水平的证据

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摘要

We report pressure-dependent photoluminescence (PL) experiments under hydrostatic pressures up to 2.16 GPa on a mid-wave infrared InAs/InAsSb type-II superlattice (T2SL) structure at different pump laser excitation powers and sample temperatures. The pressure coefficient of the T2SL transition was found to be 93 ± 2 meV·GPa. The integrated PL intensity increases with pressure up to 1.9 GPa then quenches rapidly indicating a pressure induced level crossing with the conduction band states at ∼2 GPa. Analysis of the PL intensity as a function of excitation power at 0, 0.42, 1.87, and 2.16 GPa shows a clear change in the dominant photo-generated carrier recombination mechanism from radiative to defect related. From these data, evidence for a defect level situated at 0.18 ± 0.01 eV above the conduction band edge of InAs at ambient pressure is presented. This assumes a pressure-dependent energy shift of -11 meV·GPa for the valence band edge and that the defect level is insensitive to pressure, both of which are supported by an Arrhenius activation energy analysis.
机译:我们报告了中波红外InAs / InAsSb II型超晶格(T2SL)结构在不同泵浦激光激发功率和样品温度下,在高达2.16 GPa的静水压力下的压力依赖性光致发光(PL)实验。发现T2SL转变的压力系数为93±2meV·GPa。积分PL强度随压力升高至1.9 GPa而增加,然后迅速淬灭,表明压力诱导的能级与〜2 GPa的导带状态相交。分析PL强度在0、0.42、1.87和2.16 GPa时作为激发功率的函数,显示出主要的光生载流子复合机理从辐射到缺陷的明显变化。从这些数据可以看出,在环境压力下,缺陷水平位于InAs导带边缘以上0.18±0.01 eV。假设价带边缘的压力依赖性能量移动为-11 meV·GPa,并且缺陷能级对压力不敏感,两者均由Arrhenius活化能分析支持。

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